RSS

Process to remove cured KJR silicone from IC’s (Decapping)

May 4th, 2009 by LINQblog · No Comments

Shin-Etsu KJR silicones are used extensively in the manufacture of ICs, transistors, diodes and other semiconductor devices.

KJR-4013E is a flexible, moisture-cure silicone most often used as junction-coating resins in the manufacture of diodes. KJR-651E, KJR-655E and KJR-657E are rigid thermoset polyimide-silicones used as junction coating resins in the manufacture of higher power diodes and thyristors. Both are used due to their excellent adhesion to epoxy molding compounds (EMC), high humidity resistance, and excellent volume resistivity and dielectric breakdown properties.

To be able to conduct failure analysis, customers have asked if there is a process to remove the cured silicone / polyimide-silicone from the diodes and/or thyristors (decap).

One recommendation is to use sulphuric acid (H2SO4) which can normally clearly strip organic compounds.  Nitric acid (HNO3) is another option.  If the dissolving rate is slow, adding heat to the process helps very much.  Of course, for either of these processes, a fume hood is necessary all the time.

For more information of copper wire bonding, visit us or contact us for more details.

Related Posts

  1. Silicone Optical Fiber Coating
  2. Cure schedule optimization for Junction Coating Resin KJR-651E
  3. Polyimide Tape – Silicone vs. Acrylic Adhesive

Tags: Semiconductor · Silicones

1 Like this article? Vote it up!
Not impressed? Vote it down

0 responses so far ↓

  • There are no comments yet...Be the first to react by filling out the form below.

Leave a Comment

Offers & Promotions

Payment & Shipping Options

We want your feedback

Send us your great ideas.
Any that get incorporated get you $10.